Application

17963704 · PLASMA BAFFLE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME

Filed 2022-10-11 · Granted · Patent 12322577 (2025-06-03) The official file ↗The patent and its PDF ↗ · Art unit 1718 · Examiner Yuechuan Yu Easy · CPC H01J 37/32633 · Samsung Electronics Co., Ltd. · Muir Patent Law, PLLC

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

17.1 mo

to disposition 31.7 mo

Statutes raised

102 103

1 actions read

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