Application

17987157 · BACKSIDE ETCH PROCESS FOR TRANSPARENT SILICON OXIDE TECHNOLOGY

Filed 2022-11-15 · Granted · Patent 11852800 (2023-12-26) The official file ↗The patent and its PDF ↗ · Art unit 2629 · Examiner Muhammad N Edun Easy · CPC G02B 23/125 · L3Harris Technologies, Inc. · Workman Nydegger/L3

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

3.5 mo

to disposition 13.3 mo

Statutes raised

102 DP

1 actions read

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