Application
18003877 · METAL-BASED LINER PROTECTION FOR HIGH ASPECT RATIO PLASMA ETCH
Filed 2022-12-29 · Abandoned The official file ↗ · Art unit 1713 · Examiner Jiong-Ping Lu Typical · CPC H10P 50/244 · Lam Research Corporation · WEAVER AUSTIN VILLENEUVE & SAMPSON - LAMR/NOVL
Office actions
1
first was Non-final rejection
RCEs
0
no appeal
To first action
27.0 mo
to disposition 34.2 mo
Statutes raised
102 103 112
1 actions read