Application

18010900 · Systems and Methods for Use of Low Frequency Harmonics in Bias Radiofrequency Supply to Control Uniformity of Plasma Process Results Across Substrate

Filed 2022-12-16 · Granted · Patent 12308211 (2025-05-20) The official file ↗The patent and its PDF ↗ · Art unit 2842 · Examiner Tuan Thieu Lam Typical · CPC H01J 37/32165 · Lam Research Corporation · Polygon IP, LLP / Lam Research

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

19.5 mo

to disposition 29.1 mo

Statutes raised

112

1 actions read

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