PATLY.AIApplication
18082964 · MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Filed 2022-12-16 · Granted · Patent 12210289 (2025-01-28) The official file ↗The patent and its PDF ↗ · Art unit 2882 · Examiner Hung Nguyen Easy · CPC G03F 7/70266 · Carl Zeiss SMT GmbH · EDELL, SHAPIRO & FINNAN, LLC
Office actions
1
first was Non-final rejection
RCEs
0
no appeal
To first action
20.3 mo
to disposition 25.4 mo
Statutes raised
102 103
1 actions read