Application

18101869 · MULTIPLE REFLECTOMETRY FOR MEASURING ETCH PARAMETERS

Filed 2023-01-26 · Granted · Patent 11927543 (2024-03-12) The official file ↗The patent and its PDF ↗ · Art unit 2877 · Examiner Omar H Nixon Typical · CPC G01B 11/0625 · Applied Materials, Inc. · LOWENSTEIN SANDLER LLP / AMAT

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

7.7 mo

to disposition 13.5 mo

Statutes raised

102 103

1 actions read

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