Application

18155392 · Gate All Around Transistor Device and Fabrication Methods Thereof

Filed 2023-01-17 · Granted · Patent 12349380 (2025-07-01) The official file ↗The patent and its PDF ↗ · Art unit 2893 · Examiner David C Spalla Typical · CPC H10D 64/017 · Taiwan Semiconductor Manufacturing Co., Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

4.7 mo

to disposition 29.4 mo

Statutes raised

102 103 DP

3 actions read

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