Application

18204259 · PHOTORESIST LAYER SURFACE TREATMENT, CAP LAYER, AND METHOD OF FORMING PHOTORESIST PATTERN

Filed 2023-05-31 · Granted · Patent 12057315 (2024-08-06) The official file ↗The patent and its PDF ↗ · Art unit 2812 · Examiner Reema Patel Typical · CPC H10P 76/2042 · TAIWAN SEMICONDUCTOR MANFACTURING COMPANY, LTD · Studebaker Brackett PLLC

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

6.4 mo

to disposition 14.2 mo

Statutes raised

103

1 actions read

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