Application
18225439 · RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
Filed 2023-07-24 · Granted · Patent 12572078 (2026-03-10) The official file ↗The patent and its PDF ↗ · Art unit 2878 · Examiner Sean M Luck Typical · CPC G03F 7/70033 · ASML Netherlands B.V. · Finnegan/ASML
Office actions
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first was Notice of allowance
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To first action
27.5 mo
to disposition 31.5 mo
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