Application
18476975 · ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Filed 2023-09-28 · Pending The official file ↗ · Art unit 1737 · Examiner Richard David Champion Hard · CPC C08F 212/24 · FUJIFILM Corporation · SUGHRUE MION, PLLC
Office actions
1
first was Non-final rejection
RCEs
0
no appeal
To first action
30.7 mo
to disposition n/a
Statutes raised
·
0 actions read