PATLY.AIApplication
18499548 · Shape-based proximity effect correction method for throughput, patterning fidelity, and contrast enhancement of particle beam lithography and imaging structure
Filed 2023-11-01 · Granted · Patent 12597585 (2026-04-07) The official file ↗The patent and its PDF ↗ · Art unit 2881 · Examiner Kiet Tuan Nguyen Easy · CPC H01J 37/153 · National Taipei University · BACON & THOMAS, PLLC
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