Application

18522942 · PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

Filed 2023-11-29 · Granted · Patent 12339582 (2025-06-24) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Mark F Huff Hard · CPC G03F 1/44 · TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. · Hauptman Ham, LLP (TSMC)

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

11.3 mo

to disposition 18.8 mo

Statutes raised

1 actions read

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