Application

18575532 · MASK TOPOLOGY OPTIMIZATION METHOD AND SYSTEM FOR SURFACE PLASMON NEAR-FIELD PHOTOLITHOGRAPHY

Filed 2023-12-29 · Granted · Patent 12092960 (2024-09-17) The official file ↗The patent and its PDF ↗ · Art unit 1737 · Examiner Jayson D Cosgrove Hard · CPC G03F 7/70433 · THE INSTITUTE OF OPTICS AND ELECTRONICS, THE CHINESE ACADEMY OF SCIENCES · AMIN WASSERMAN GURNANI LLP

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

7.0 mo

to disposition 8.6 mo

Statutes raised

0 actions read

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