PATLY.AIApplication
18575625 · PHOTORESIST COMPOSITION AND USE THEREOF
Filed 2023-12-29 · Abandoned The official file ↗ · Art unit 1737 · Examiner Richard David Champion Hard · CPC G03F 7/0045 · THE INSTITUTE OF OPTICS AND ELECTRONICS, THE CHINESE ACADEMY OF SCIENCES · AMIN WASSERMAN GURNANI LLP
Office actions
3
first was Non-final rejection
RCEs
1
no appeal
To first action
5.5 mo
to disposition 20.6 mo
Statutes raised
102 103 112
3 actions read