Application

18652343 · CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

Filed 2024-05-01 · Pending The official file ↗ · Art unit 1737 · Examiner Anna E Malloy Hard · CPC G03F 7/0045 · Shin-Etsu Chemical Co., Ltd. · WHDA, LLP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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