Application

18791575 · INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON METAL SUBSTRATE

Filed 2024-08-01 · Granted · Patent 12381076 (2025-08-05) The official file ↗The patent and its PDF ↗ · Art unit 2891 · Examiner Asok K Sarkar Easy · CPC H10P 14/6682 · Gelest, Inc. · PANITCH SCHWARZE BELISARIO & NADEL LLP

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

8.5 mo

to disposition 12.1 mo

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.