Application
18850628 · ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
Filed 2024-09-25 · Granted · Patent 12601976 (2026-04-14) The official file ↗The patent and its PDF ↗ · Art unit 2899 · Examiner Caleen O Sullivan Easy · CPC H10P 72/0454 · Lam Research Corporation · WEAVER AUSTIN VILLENEUVE & SAMPSON - LAMR/NOVL
Office actions
2
first was Non-final rejection
RCEs
1
no appeal
To first action
5.1 mo
to disposition 18.6 mo
Statutes raised
103
2 actions read