Application

18944317 · METHOD FOR FABRICATING PHOTOMASK AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH DAMASCENE STRUCTURE

Filed 2024-11-12 · Pending The official file ↗ · Art unit 2814 · Examiner Tiberiu Dan Onuta Typical · CPC H10P 76/2041 · NANYA TECHNOLOGY CORPORATION · IntelliFluence Patent Firm

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

17.2 mo

to disposition n/a

Statutes raised

112

1 actions read

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