Application

18948779 · REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE EQUIPPED WITH CONDUCTIVE FILM

Filed 2024-11-15 · Granted · Patent 12339580 (2025-06-24) The official file ↗The patent and its PDF ↗ · Art unit 1700 · Examiner Srilakshmi K Kumar Typical · CPC G03F 1/24 · AGC Inc. · OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P.

Office actions

first was Notice of allowance

RCEs

no appeal

To first action

3.2 mo

to disposition 7.3 mo

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.