Application

19001893 · PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Filed 2024-12-26 · Pending The official file ↗ · Art unit 6212 · Examiner Benjamin L Utech · CPC H01J 37/32165 · Tokyo Electron Limited · Xsensus

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

19.7 mo

to disposition n/a

Statutes raised

0 actions read

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