Application
19046233 · SURFACE TREATMENT METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE SURFACE TREATMENT METHOD, COMPOSITION FOR SURFACE TREATMENT, AND SYSTEM FOR PRODUCING SEMICONDUCTOR SUBSTRATE INCLUDING THE COMPOSITION FOR SURFACE TREATMENT
Filed 2025-02-05 · Pending The official file ↗ · Art unit 1767 · Examiner Mohammadreza Asdjodi Typical · CPC H10P 52/402 · Fujimi Incorporated · FOLEY & LARDNER LLP
Office actions
0
first was
RCEs
0
no appeal
To first action
n/a
to disposition n/a
Statutes raised
·
0 actions read