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19048950 · System and Method for Atomic Layer Etching Using an Added Sidewall Coil in Proximity to a Chuck for Substrate Edge Uniformity Control

Filed 2025-02-09 · Pending The official file ↗ · Art unit 1713 · Examiner Anita Karen Alanko Typical · CPC H01J 37/321 · Yang Pan

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first was Restriction requirement
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