Application

19061505 · P-Metal Gate First Gate Replacement Process for Multigate Devices

Filed 2025-02-24 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC H10D 64/017 · Taiwan Semiconductor Manufacturing Co., Ltd. · Haynes and Boone, LLP (24061)

Office actions

first was

RCEs

no appeal

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n/a

to disposition n/a

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