Application

19098202 · TOP SOURCE DRAIN AND ASSOCATED ILD FORMATION WITHIN A STACKED TRANSISTOR

Filed 2025-04-02 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC H10D 84/832 · International Business Machines Corporation · Harrity & Harrity, LLP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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