Application
19154778 · SYSTEM FOR SUPPORTING A PELLICLE IN A LITHOGRAPHIC APPARATUS, ALLOWING FOR PRESSURE INCREASE IN A REGION BETWEEN THE PELLICLE AND A PATTERNING DEVICE
Filed 2025-08-07 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 1/64 · ASML NETHERLANDS B.V. · Pillsbury Winthrop Shaw Pittman, LLP
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