Application

19177360 · APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFER

Filed 2025-04-11 · Pending The official file ↗ · Art unit 1711 · Examiner David G Cormier Hard · CPC H10P 72/0414 · Taiwan Semiconductor Manufacturing Company. Ltd. · STERNE, KESSLER, GOLDSTEIN & FOX P.L.L.C.

Office actions

first was Non-final rejection

RCEs

no appeal

To first action

14.5 mo

to disposition n/a

Statutes raised

102 103 112

1 actions read

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