Application

19212331 · METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBSTRATES

Filed 2025-05-19 · Pending The official file ↗ · Art unit 1713 · Examiner Erin Flanagan Bergner Typical · CPC H10P 72/0456 · ACM RESEARCH (SHANGHAI), INC. · OSHA BERGMAN WATANABE & BURTON LLP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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