Application

19273399 · BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY WITH HARD MASK FILM CONTAINING CHROME AND NIOBIUM

Filed 2025-07-18 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 1/24 · S&S TECH Co., Ltd. · William Park & Associates LTD.

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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