Application

19279251 · Hybrid Plasma-Enhanced Atomic Layer Etching (PEALE) And Plasma-Enhanced Atomic Layer Deposition (PEALD) In A Single Reactor/Chamber

Filed 2025-07-24 · Pending The official file ↗ · Art unit 1718 · Examiner Mohammad Mayy Typical · CPC H01J 37/32174 · Nano-Master, Inc. · Marek Alboszta

Office actions

first was Restriction requirement

RCEs

no appeal

To first action

13.4 mo

to disposition n/a

Statutes raised

0 actions read

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