Application

19299451 · RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Filed 2025-08-14 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 7/0045 · JSR CORPORATION · Element IP, PLC

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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