Application

19310981 · IMPEDANCE MATCHING MODULE, IMPEDANCE MATCHING CIRCUIT, PLASMA PROCESS SUPPLY SYSTEM AND PLASMA PROCESS SYSTEM

Filed 2025-08-27 · Pending The official file ↗ · Art unit 2845 · Examiner Srinivas Sathiraju Typical · CPC H01J 37/32183 · TRUMPF Hüttinger GmbH + Co. KG · Leydig, Voit & Mayer, Ltd. (Frankfurt office)

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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