PATLY.AIApplication
19339021 · SEMICONDUCTOR PROCESSING SYSTEMS, CHEMICAL VAPOR DEPOSITION (CVD) REACTORS AND METHODS FOR DEPOSITING MATERIAL ON SEMICONDUCTOR SUBSTRATES WITH UNIFORM TEMPERATURE AND GAS FLOW ACROSS THE SUBSTRATE SURFACE
Filed 2025-09-24 · Pending The official file ↗ · Art unit 1718 · Examiner Kurt D Sweely Typical · CPC H10P 14/6334 · Tokyo Electron Limited · TEL-Egan, Enders & Huston LLP.
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