PATLY.AIApplication
19393174 · PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
Filed 2025-11-18 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 7/0042 · Lam Research Corporation · WEAVER AUSTIN VILLENEUVE & SAMPSON - LAMR/NOVL
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