Application

19419865 · METHOD FOR INCORPORATING TEMPERATURE-REGULATING HOLLOW STRUCTURES INTO A SUBSTRATE, IN PARTICULAR INTO A SUBSTRATE FOR AN OPTICAL ELEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, AND PROCESSING SYSTEM THEREFOR, METHOD AND SUBSTRATE FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, AND SEMICONDUCTOR TECHNOLOGY APPARATUS

Filed 2025-12-15 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC C03C 15/00 · Carl Zeiss SMT GmbH · EDELL, SHAPIRO & FINNAN, LLC

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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