Application

19489668 · RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Filed 2025-12-03 · Pending The official file ↗ · Art unit · SAMSUNG SDI CO., LTD. · LEE IP LAW, P.C.

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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