Application

19547971 · PREPARATION OF POLYMER, PREPARATION OF CHEMICALLY AMPLIFIED RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, POLYMER, AND CHEMICALLY AMPLIFIED RESIST COMPOSITION

Filed 2026-02-24 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 7/0397 · Shin-Etsu Chemical Co., Ltd. · WHDA, LLP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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