PATLY.AIApplication
19560527 · SOURCE/DRAINS IN SEMICONDUCTOR DEVICES AND METHODS OF FORMING THEREOF
Filed 2026-03-09 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC H10D 30/0323 · Taiwan Semiconductor Manufacturing Co., Ltd. · SLATER MATSIL, LLP/TSMC
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