Application

19567858 · METHOD FOR FABRICATING NMOS HIGH-K METAL GATE AND PMOS HIGH-K METAL GATE

Filed 2026-03-16 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC H10D 64/017 · Huahong Integrated Circuit(Chengdu) Corporation · Quarles & Brady LLP/ADSERO IP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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