PATLY.AIApplication
19575441 · FABRICATION OF GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING COMMON METAL GATES AND HAVING GATE DIELECTRICS WITH A DIPOLE LAYER
Filed 2026-03-23 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC H10D 84/0181 · Intel Corporation · SCHWABE, WILLIAMSON & WYATT, P.C.
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