Application

19601099 · PROCESS CHAMBER FOR THE VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER, DEVICE FOR VAPOR PHASE DEPOSITION, METHOD FOR HEATING SUBSTRATES IN A PROCESS CHAMBER AND METHOD FOR VAPOR PHASE DEPOSITION OF A SEMICONDUCTOR LAYER

Filed 2026-06-25 · Pending The official file ↗ · Art unit · VOLPE KOENIG

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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