Application

19606919 · COMPOSITION FOR FORMING LITHOGRAPHY UNDERLAYER FILM, LITHOGRAPHY UNDERLAYER FILM, POSITIVE RESIST COMPOSITION, RESIST FILM, AND METHOD FOR FORMING RESIST PATTERN

Filed 2026-07-16 · Pending The official file ↗ · Art unit · Mitsubishi Gas Chemical Company, Inc. · FITCH EVEN TABIN & FLANNERY, LLP

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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