Application

19625551 · NITROGEN ATOM-CONTAINING SUBSTRATE COATING AGENT COMPOSITION, RESIST UNDERLAYER FILM, LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

Filed 2026-09-18 · Pending The official file ↗ · Art unit · Nissan Chemical Corporation · GREENBLUM & BERNSTEIN, P.L.C.

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.