Application

19627178 · COMPOSITION FOR FORMING A RESIST UNDERLAYER FILM, A RESIST UNDERLAYER FILM, A METHOD FOR FORMING A RESIST PATTERN AND A METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE

Filed 2026-09-23 · Pending The official file ↗ · Art unit · Nissan Chemical Corporation · GREENBLUM & BERNSTEIN, P.L.C.

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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