Application

19669970 · EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE APPARATUS, EUV LITHOGRAPHY SYSTEM, AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

Filed 2026-05-06 · Pending The official file ↗ · Art unit OPAP · Examiner Docket Central Easy · CPC G03F 7/70033 · TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · WPAT, PC

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

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