Application

19880982 · GLASS SUBSTRATE FOR EUV LITHOGRAPHY AND MASK BLANK FOR EUV LITHOGRAPHY

Filed 2026-09-30 · Pending The official file ↗ · Art unit · AGC Inc. · OBLON, MCCLELLAND, MAIER & NEUSTADT, L.L.P.

Office actions

first was

RCEs

no appeal

To first action

n/a

to disposition n/a

Statutes raised

0 actions read

Unlock the prosecution timelineIncluded in Pro, from $29 a month. Cancel any time.