Patent AnalyticsExaminers
Rankings

Company or institution

SHINCRON CO., LTD.

36 applicationsfiled 2007 to 2026

Allowance rate
45%
−30 pts vs the USPTO range 30% to 62%
Rejections before allowance
3.3
+1.8 vs the USPTO
Months to first action
20.1 mo
+1.5 vs the USPTO
Needed an RCE
58%
+30 pts vs the USPTO

Timeline

Applications by filing year: drag across the years to study a period

Allowed in green, abandoned in red, pending in grey. The figures above and the charts that can be recomputed by filing year follow the span you pick.

Compared with the office

Against every applicant before the USPTO

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Trend

Allowance by filing year

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Rejection fingerprint

What gets rejected, by statute

Share of parsed office actions raising each ground; blue is the USPTO.

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What works

Allowance by strategy used

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Interviews

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Applications

Every application in the record

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
18875624YTTRIUM-BASED FILM AND METHOD FOR PRODUCING SAME2026-01-14Pending00n/a
19482734FILM-FORMING APPARATUS AND MATERIAL SUPPLY DEVICE USED FOR SAME2025-11-07Pending00n/a
18996018HOMOEPITAXIAL THIN FILM, MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF2025-09-10Pending00n/a
15934766Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15805985Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15586795Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15677936Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15961011Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15189316Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15588377Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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