Law firm or agent

Moser Taboada / Applied Materials, Inc.

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1,399 applicationsfiled 2006 to 2026

Allowance rate

79%

+4 pts vs the USPTO range 77% to 81%

Rejections before allowance

2.0

+0.4 vs the USPTO

Months to first action

20.9 mo

+2.3 vs the USPTO

Needed an RCE

37%

+10 pts vs the USPTO

Timeline

Applications by filing year: drag across the years to study a period

Allowed in green, abandoned in red, pending in grey. The figures above and the charts that can be recomputed by filing year follow the span you pick.

Compared with the office

Against every applicant before the USPTO

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Trend

Allowance by filing year

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Domains

Where the applications fall

CPC subclasses

H10P 553 apps

C23C 235 apps

H01J 227 apps

H10W 102 apps

H10D 49 apps

G03F 16 apps

Art units

1716189 apps

1794131 apps

171879 apps

171368 apps

281250 apps

171442 apps

Examiners met

The examiners seen most, and how it went with each

Jason Berman54 apps

94%

Rudy Zervigon41 apps

75%

Rodney Glenn McDonald37 apps

89%

Michael A Band30 apps

72%

Docket Central26 apps

n/a

Jeffrie Robert Lund24 apps

91%

Yuechuan Yu20 apps

79%

Benjamin R Kendall20 apps

53%

Bars show the share of decided applications that were allowed.

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Who they file for

Clients with the most applications

APPLIED MATERIALS, INC.1,387 apps

79%

APPLIED MATERIAL, INC.3 apps

67%

NATIONAL UNIVERSITY OF SINGAPORE3 apps

100%

HELLER INDUSTRIES, INC.1 apps

100%

Nanyang Technological University1 apps

n/a

Bars show the share of decided applications that were allowed.

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Rejection fingerprint

What gets rejected, by statute

Share of parsed office actions raising each ground; blue is the USPTO.

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What works

Allowance by strategy used

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Interviews

Does an interview help?

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Applications

Every application in the record

Application	Title	Filed	Status	Rejections	RCEs	To 1st action
19638239	Remote Surface Wave Propagation for Semiconductor Chamber	2026-04-03	Pending	0	0	n/a
19636298	Substrate Processing Chamber with Plasma Confinement	2026-04-01	Pending	0	0	n/a
19457991	SHADOW RING FOR SUBSTRATE BOND PROTECTION IN PLASMA ETCH CHAMBER	2026-01-23	Pending	0	0	n/a
15221661	Method and apparatus for adaptive signal processing	2012-01-10	Allowed	1	0	12.0 mo
15228503	Composition and method for controlled release	2015-02-11	Abandoned	4	1	23.0 mo
15594924	Distributed ledger transaction verification	2018-03-12	Allowed	3	0	20.0 mo
15216591	Thermal management of battery assemblies	2021-04-13	Pending	2	1	17.0 mo
15534448	Machine learning model for anomaly detection	2012-05-14	Allowed	1	0	14.0 mo
15216495	Wireless power transfer coil arrangement	2015-06-15	Abandoned	4	1	25.0 mo
15107864	Catalyst for selective hydrogenation	2018-07-16	Allowed	3	0	22.0 mo

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