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Topic

Atomic layer deposition Steady

1,128 applications whose title mentions it. Its share of new filings over the last two years is 1% above the four years before.

Allowance rate
72%
−3 pts vs the USPTO 998 decided
Months to first action
18.1 mo
−0.5 vs the USPTO
Applications
1,128.0
in the record
Allowed
721.0
277 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19626107METHOD OF PRODUCING THIN-FILM AND THIN-FILM FORMING RAW MATERIAL FOR ATOMIC LAYER D…2026-09-21Pending00n/a
19623490MIXED MODE ATOMIC LAYER DEPOSITION/CHEMICAL VAPOR DEPOSITION2026-09-11Pending00n/a
19618667AMPOULE CONTAINING SOLID PRECURSOR FOR ATOMIC LAYER DEPOSITION PROCESSES2026-08-26Pending00n/a
15288498Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15526547Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15284291Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15814352Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15383740Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15709827Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15557475Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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