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Topic

Plasma source Steady

486 applications whose title mentions it. Its share of new filings over the last two years is 12% above the four years before.

Allowance rate
76%
level with the USPTO 438 decided
Months to first action
20.2 mo
+1.6 vs the USPTO
Applications
486.0
in the record
Allowed
331.0
107 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19624347High Efficiency Plasma Source with Chemistry Conversion2026-09-15Pending00n/a
19622919PLASMA SOURCE, PLASMA SOURCE ASSEMBLY, AND SUBSTRATE PROCESSING APPARATUS2026-09-10Pending00n/a
19621472PLASMA SOURCE AND SUBSTRATE PROCESSING APPARATUS2026-09-04Pending00n/a
15443781Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15614697Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15850010Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15236461Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15219385Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15567721Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15507951Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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