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Topic

Polishing pad Steady

903 applications whose title mentions it. Its share of new filings over the last two years is 21% above the four years before.

Allowance rate
71%
−4 pts vs the USPTO 790 decided
Months to first action
21.7 mo
+3.1 vs the USPTO
Applications
903.0
in the record
Allowed
562.0
228 abandoned

Filings by year

How often the topic was filed

The most recent years are still filling in.

Who files it

Companies and institutions

Bars show the share of decided applications that were allowed.

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Applications

Recent applications on this topic

ApplicationTitleFiledStatusRejectionsRCEsTo 1st action
19882913DIRECT TO PAD DISPENSING OF POLISHING COMPOUND FOR AUTOMATED PAINT REPAIR2026-10-07Pending00n/a
19882064CHEMICAL MECHANICAL POLISHING SMART IN-SITU PAD CONDITIONER2026-10-02Pending00n/a
19628708RESIN POROUS BODY, COMPOUND SEMICONDUCTOR POLISHING PAD, AND METHOD FOR MANUFACTURI…2026-09-28Pending00n/a
15570391Method and apparatus for adaptive signal processing2012-01-10Allowed1012.0 mo
15176761Composition and method for controlled release2015-02-11Abandoned4123.0 mo
15527703Distributed ledger transaction verification2018-03-12Allowed3020.0 mo
15384910Thermal management of battery assemblies2021-04-13Pending2117.0 mo
15394002Machine learning model for anomaly detection2012-05-14Allowed1014.0 mo
15102673Wireless power transfer coil arrangement2015-06-15Abandoned4125.0 mo
15760842Catalyst for selective hydrogenation2018-07-16Allowed3022.0 mo
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